完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Ling, H. S. | en_US |
dc.contributor.author | Wang, S. Y. | en_US |
dc.contributor.author | Lee, C. P. | en_US |
dc.contributor.author | Lo, M. C. | en_US |
dc.date.accessioned | 2014-12-08T15:40:04Z | - |
dc.date.available | 2014-12-08T15:40:04Z | - |
dc.date.issued | 2009-11-01 | en_US |
dc.identifier.issn | 1350-4495 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1016/j.infrared.2009.05.026 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/27365 | - |
dc.description.abstract | LWIR InAs/Al(0.3)Ga(0.7)As/In(0.15)Ga(0.85)As confinement-enhanced DWELL (CE-DWELL) QDIPs with operation temperatures higher than 200 K are reported. A thin Al(0.3)Ga(0.7)As barrier layer was inserted above the InAs QDs to improve the confinement of QD states in the In(0.15)Ga(0.85)As DWELL structure and the device performance. The better confinement of the electronic states increases the oscillator strength of the infrared absorption. The higher excited state energy also improves the escape probability of the photoelectrons. Compared with the conventional DWELL QDIPs, the quantum efficiency increases for more than 20 times and the detectivity is an order of magnitude higher at 77 K. With better device parameters of CE-DWELL, it is possible to achieve high quantum efficiency, high operating temperature and long wavelength detection at the same time. (C) 2009 Elsevier B.V. All rights reserved. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Quantum dot | en_US |
dc.subject | Infrared detector | en_US |
dc.subject | Photodetector | en_US |
dc.subject | Intersubband | en_US |
dc.subject | DWELL | en_US |
dc.subject | LWIR | en_US |
dc.title | Confinement-enhanced dots-in-a-well QDIPs with operating temperature over 200 K | en_US |
dc.type | Article; Proceedings Paper | en_US |
dc.identifier.doi | 10.1016/j.infrared.2009.05.026 | en_US |
dc.identifier.journal | INFRARED PHYSICS & TECHNOLOGY | en_US |
dc.citation.volume | 52 | en_US |
dc.citation.issue | 6 | en_US |
dc.citation.spage | 281 | en_US |
dc.citation.epage | 284 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000273240700015 | - |
顯示於類別: | 會議論文 |