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dc.contributor.authorCHANG, SJen_US
dc.contributor.authorLEE, CPen_US
dc.date.accessioned2014-12-08T15:04:15Z-
dc.date.available2014-12-08T15:04:15Z-
dc.date.issued1993-12-01en_US
dc.identifier.issn0018-9383en_US
dc.identifier.urihttp://dx.doi.org/10.1109/16.249463en_US
dc.identifier.urihttp://hdl.handle.net/11536/2750-
dc.description.abstractLight sensitivity of sidegating effect in GaAs MESFET's is investigated by performing two-dimensional numerical simulations on realistic sidegate structures. Mechanism of the light-induced sidegating is identified and compared with alternative mechanisms of sidegating including trap-fill-limited conduction and conduction through the Schottky-i-n(sidegate) structure. Ionization of hole traps in the substrate by capturing the photo-generated holes is found to be the major cause of light-induced sidegating effect which occurs even at very low sidegate voltages. In the presence of the hole traps occupied by holes, the potential distribution in the electron-trap-rich substrate becomes similar to that in the hole-trap-rich substrate, i.e., the negative voltage applied to the sidegate is carried over to the channel-substrate interface.en_US
dc.language.isoen_USen_US
dc.titleLIGHT-INDUCED SIDEGATING EFFECT IN GAAS-MESFETSen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/16.249463en_US
dc.identifier.journalIEEE TRANSACTIONS ON ELECTRON DEVICESen_US
dc.citation.volume40en_US
dc.citation.issue12en_US
dc.citation.spage2186en_US
dc.citation.epage2191en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:A1993MP36300005-
dc.citation.woscount3-
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