完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | CHANG, SJ | en_US |
dc.contributor.author | LEE, CP | en_US |
dc.date.accessioned | 2014-12-08T15:04:15Z | - |
dc.date.available | 2014-12-08T15:04:15Z | - |
dc.date.issued | 1993-12-01 | en_US |
dc.identifier.issn | 0018-9383 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1109/16.249463 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/2750 | - |
dc.description.abstract | Light sensitivity of sidegating effect in GaAs MESFET's is investigated by performing two-dimensional numerical simulations on realistic sidegate structures. Mechanism of the light-induced sidegating is identified and compared with alternative mechanisms of sidegating including trap-fill-limited conduction and conduction through the Schottky-i-n(sidegate) structure. Ionization of hole traps in the substrate by capturing the photo-generated holes is found to be the major cause of light-induced sidegating effect which occurs even at very low sidegate voltages. In the presence of the hole traps occupied by holes, the potential distribution in the electron-trap-rich substrate becomes similar to that in the hole-trap-rich substrate, i.e., the negative voltage applied to the sidegate is carried over to the channel-substrate interface. | en_US |
dc.language.iso | en_US | en_US |
dc.title | LIGHT-INDUCED SIDEGATING EFFECT IN GAAS-MESFETS | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1109/16.249463 | en_US |
dc.identifier.journal | IEEE TRANSACTIONS ON ELECTRON DEVICES | en_US |
dc.citation.volume | 40 | en_US |
dc.citation.issue | 12 | en_US |
dc.citation.spage | 2186 | en_US |
dc.citation.epage | 2191 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:A1993MP36300005 | - |
dc.citation.woscount | 3 | - |
顯示於類別: | 期刊論文 |