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dc.contributor.authorLai, FIen_US
dc.contributor.authorHsueh, THen_US
dc.contributor.authorChang, YHen_US
dc.contributor.authorShu, WCen_US
dc.contributor.authorLai, LHen_US
dc.contributor.authorKuo, HCen_US
dc.contributor.authorWang, SCen_US
dc.date.accessioned2014-12-08T15:40:18Z-
dc.date.available2014-12-08T15:40:18Z-
dc.date.issued2003-10-01en_US
dc.identifier.issn0038-1101en_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0038-1101(03)00142-4en_US
dc.identifier.urihttp://hdl.handle.net/11536/27512-
dc.description.abstractIn this paper, we report a novel implanted vertical surface emitting lasers (VCSELs) utilizing silicon implantation induced disordering. The VCSELs exhibit kink-free current-light Output performance with threshold currents similar to2.4 mA, and the slope efficiencies similar to0.45 W/A. The threshold current change with temperature is minimal and the slope efficiency drops less than similar to30% when the substrate temperature is raised to 90 degreesC. The eye diagram of VCSEL operating at 2.125 Gb/s with 7 mA bias and 10 dB extinction ratio shows very clean eye with jitter less than 30 ps. We have accumulated life test data up to 5000 It at 100 degreesC/20 mA with exceptional reliability and the WHTOL (high temperature and high humidity 85 degreesC/85 operating lifetime) biased at 8 mA has passed over 2000 h. (C) 2003 Elsevier Ltd. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectVCSELen_US
dc.subjectSi implanten_US
dc.subjectdisorderingen_US
dc.subjectkinken_US
dc.titlePerformance of 850 nm AlGaAs/GaAs implanted VCSELs utilizing silicon implantation induced disorderingen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/S0038-1101(03)00142-4en_US
dc.identifier.journalSOLID-STATE ELECTRONICSen_US
dc.citation.volume47en_US
dc.citation.issue10en_US
dc.citation.spage1805en_US
dc.citation.epage1809en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000185129400034-
dc.citation.woscount3-
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