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dc.contributor.authorLee, YJen_US
dc.contributor.authorChao, TSen_US
dc.contributor.authorHuang, TYen_US
dc.date.accessioned2014-12-08T15:40:21Z-
dc.date.available2014-12-08T15:40:21Z-
dc.date.issued2003-09-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.42.5405en_US
dc.identifier.urihttp://hdl.handle.net/11536/27550-
dc.description.abstractIn this paper, we discuss dynamic threshold MOS (DTMOS) operations for nMOSFETs of different dielectric types and thicknesses. We found that, under the DT mode of operation, all devices exhibit a threshold voltage close to 0.7 V, independent of the thickness and gate dielectric type of the device. This is due to the diminished influence of the body effect factor. Formulations of threshold voltage and subthreshold swing of DTMOS are developed to gain insights into this unique phenomenon, and simulation of the subthreshold swing is also provided.en_US
dc.language.isoen_USen_US
dc.subjectDTMOSen_US
dc.subjectgate oxideen_US
dc.subjectsubthreshold swingen_US
dc.titleThe effects of dielectric type and thickness on the characteristics of dynamic threshold metal oxide semiconductor transistorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.42.5405en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.citation.volume42en_US
dc.citation.issue9Aen_US
dc.citation.spage5405en_US
dc.citation.epage5409en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000185565300002-
dc.citation.woscount1-
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