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完整後設資料紀錄
DC 欄位值語言
dc.contributor.authorLIN, HCen_US
dc.contributor.authorLI, MHen_US
dc.contributor.authorLI, JJen_US
dc.contributor.authorJANG, FIen_US
dc.contributor.authorFU, CMen_US
dc.contributor.authorJUANG, JYen_US
dc.contributor.authorUEN, TMen_US
dc.contributor.authorGOU, YSen_US
dc.date.accessioned2014-12-08T15:04:15Z-
dc.date.available2014-12-08T15:04:15Z-
dc.date.issued1993-12-01en_US
dc.identifier.issn0577-9073en_US
dc.identifier.urihttp://hdl.handle.net/11536/2764-
dc.description.abstractWe have studied the influence of heat treatment on the properties of the superconducting transition and critical current on the TiBaCaCuO thin films prepared by DC sputtering. The superconducting transition temperature is increasing as the maximum annealing temperature is raised. The XRD analysis reveals the evolution of the major phase of the films from 2212 phase to 2223 phase, when the films were annealed at maximum temperature varied from 895-degrees-C to 922-degrees-C. The surface morphology of the sample reveals the formation of the intergrowth of grains by partial melting, which may associated with the evolution of cntical current for the annealed films.en_US
dc.language.isoen_USen_US
dc.titleEFFECTS OF ANNEALING CONDITIONS ON THE PHASE-STABILITY AND SUPERCONDUCTING PROPERTIES OF DC SPUTTERING TLBACACUO THIN-FILMSen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.journalCHINESE JOURNAL OF PHYSICSen_US
dc.citation.volume31en_US
dc.citation.issue6en_US
dc.citation.spage1233en_US
dc.citation.epage1237en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:A1993MU73000064-
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