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dc.contributor.authorPAN, SCen_US
dc.contributor.authorCHEN, YFen_US
dc.contributor.authorCHANG, DCen_US
dc.contributor.authorCHANG, CYen_US
dc.contributor.authorWANG, PJen_US
dc.date.accessioned2014-12-08T15:04:15Z-
dc.date.available2014-12-08T15:04:15Z-
dc.date.issued1993-12-01en_US
dc.identifier.issn0577-9073en_US
dc.identifier.urihttp://hdl.handle.net/11536/2767-
dc.description.abstractWell-resolved band-edge luminescence spectra are reported for strained Si0.84Ge0.16/Si quantum wells grown by ultrahigh-vacuum chemical-vapor-deposition at 550-degrees-C. Phonon assisted transitions are also observed and the phonon structure of the spectrum is resolved. Blue shifting of the peak emission with decreasing well width is found in good agreement with theoretical calculations. The effects of hydrogenation using photochemical vapor deposition system are studied and an enhancement of the band edge luminescence intensity by a factor of three accompanied with a decrease in the intensity of the peaks coming from lattice defects is observed after hydrogenation. These results indicate that photochemical vapor deposition system is a useful tool for injecting atomic hydrogen into Si1-xGex/Si quantum wells and to enhance the band edge luminescence as well as to passivate the activity of the defects.en_US
dc.language.isoen_USen_US
dc.titleENHANCEMENT OF BAND-EDGE LUMINESCENCE IN HYDROGENATED STRAINED SI(0.84)GE(0.16)/SI QUANTUM-WELLS BY PHOTOCHEMICAL VAPOR-DEPOSITIONen_US
dc.typeArticleen_US
dc.identifier.journalCHINESE JOURNAL OF PHYSICSen_US
dc.citation.volume31en_US
dc.citation.issue6en_US
dc.citation.spage759en_US
dc.citation.epage765en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:A1993MK00100006-
dc.citation.woscount1-
Appears in Collections:Articles