標題: | HRTEM investigation of high-reflectance AlN/GaN distributed Bragg-reflectors by inserting AlN/GaN superlattice |
作者: | Li, Zhen-Yu Lu, Tien-Chang Kuo, Hao-Chung Wang, Shing-Chung Lo, Ming-Hua Lau, K. M. 光電工程學系 Department of Photonics |
關鍵字: | Characterization;Metal-organic chemical vapor deposition;Quantum wells;Nitrides;Semiconducting aluminum compounds;Laser diodes |
公開日期: | 1-五月-2009 |
摘要: | A high-quality AlN/GaN distributed Bragg-reflectors (DBR) was successfully grown on sapphire substrate by low-pressure metal-organic chemical vapor deposition using ultra-thin AlN/GaN super-lattice insertion layers (SLILs). The reflectivity of AlN/GaN DBR with ultra-thin AlN/GaN SLIL was measured and achieved blue peak reflectivity of 99.4% at 462 nm. The effect of ultra-thin AlN/GaN super-lattice insertion layer was examined in detail by transmission electron microscopy, and indicated that the crack of AlN/GaN DBR can be suppress by inserting AlN/GaN SLIL. For electronic properties, the turn on voltage is about 4.1 V and CW laser action of vertical-cavity surface-emitting laser (VCSEL) was achieved at a threshold injection current of 1.4 mA at 77 K, with an emission wavelength of 462 nm. (C) 2009 Elsevier B.V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.jcrysgro.2009.01.098 http://hdl.handle.net/11536/27709 |
ISSN: | 0022-0248 |
DOI: | 10.1016/j.jcrysgro.2009.01.098 |
期刊: | JOURNAL OF CRYSTAL GROWTH |
Volume: | 311 |
Issue: | 10 |
起始頁: | 3089 |
結束頁: | 3092 |
顯示於類別: | 會議論文 |