Title: Mechanism and modeling of ring pattern formation for electron beam exposure on Zwitterresist
Authors: Chen, JK
Ko, FH
Chen, HL
Chang, FC
應用化學系
Department of Applied Chemistry
Keywords: zwitterresist;electron beam;heating effect;ring pattern;throughput
Issue Date: 1-Jun-2003
Abstract: The novel sensitivity curve was determined for the zwitterresist. The irradiation dose in the center could create a ring pattern due to simultaneous exhibition of the positive tone and negative tone of zwitterresist. The natural logarithm dependence of ring width and electron beam dose was linear in two ranges, irrespective of the dot design radius. The heating effect was identified from 600 muC/cm(2), while it could be neglected at less than 600 muC/cm(2). Mathematical modeling for the prediction of ring width for zwitterresist, was achieved by considering the electron scattering and heating effects. The results of experimental measurement and modeling on ring width showed a very good correlation.
URI: http://dx.doi.org/10.1143/JJAP.42.3838
http://hdl.handle.net/11536/27815
ISSN: 0021-4922
DOI: 10.1143/JJAP.42.3838
Journal: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume: 42
Issue: 6B
Begin Page: 3838
End Page: 3841
Appears in Collections:Conferences Paper


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