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dc.contributor.authorLin, PYen_US
dc.contributor.authorWu, YCSen_US
dc.date.accessioned2014-12-08T15:40:51Z-
dc.date.available2014-12-08T15:40:51Z-
dc.date.issued2003-05-26en_US
dc.identifier.issn0254-0584en_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0254-0584(03)00109-3en_US
dc.identifier.urihttp://hdl.handle.net/11536/27852-
dc.description.abstractMicron-size V defects were found on the hydride vapor phase epitaxy grown GaN films. When the film thickness increased, the diameter of V defects increased, but the density of the defects decreased. The defect has six {1 1 0 1} facets, which encircle to form a concave hexagonal pyramid. Its shape is similar to that of epitaxial lateral overgrowth (ELO) GaN crystal grown on a dot-patterned GaN underlying layer. Through the analysis of the growth mechanism of ELO GaN, the growth mechanism of the V defects was investigated. (C) 2003 Elsevier Science B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectGaNen_US
dc.subjecthydride vapor phase epitaxyen_US
dc.subjectV defecten_US
dc.subjectepitaxial lateral overgrowthen_US
dc.subjectgrowth mechanismen_US
dc.titleThe growth mechanism of micron-size V defects on the hydride vapor phase epitaxy grown undoped GaN filmsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/S0254-0584(03)00109-3en_US
dc.identifier.journalMATERIALS CHEMISTRY AND PHYSICSen_US
dc.citation.volume80en_US
dc.citation.issue2en_US
dc.citation.spage397en_US
dc.citation.epage400en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000182508000003-
dc.citation.woscount3-
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