Investigation of Cu/TaN metal gate for metal-oxide-silicon devices (vol 150, pg G22, 2003)

標題:	Investigation of Cu/TaN metal gate for metal-oxide-silicon devices (vol 150, pg G22, 2003)
作者:	Tsui, BY Huang, CF 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics
公開日期:	1-May-2003
URI:	http://dx.doi.org/10.1149/1.1566966 http://hdl.handle.net/11536/27945
ISSN:	0013-4651
DOI:	10.1149/1.1566966
期刊:	JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume:	150
Issue:	5
起始頁:	L10
結束頁:	L10
Appears in Collections:	Articles

Files in This Item:

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.