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dc.contributor.authorFang, THen_US
dc.contributor.authorJian, SRen_US
dc.contributor.authorChuu, DSen_US
dc.date.accessioned2014-12-08T15:41:06Z-
dc.date.available2014-12-08T15:41:06Z-
dc.date.issued2003-04-07en_US
dc.identifier.issn0022-3727en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0022-3727/36/7/317en_US
dc.identifier.urihttp://hdl.handle.net/11536/27967-
dc.description.abstractCharacteristics of crystalline structure, roughness and nanotribology of ZnO thin films deposited under various power conditions were achieved by means of x-ray diffraction and scanning probe microscopy (SPM). The ZnO thin films were deposited on the silicon (100) substrates by a radio frequency magnetron sputtering system. Fractal analysis was derived from SPM images, to calculate the fractal dimension complexity of the surface geometry, via a substituting structure function. The results show that the roughness decreases and nanowear rate increases as the sputtering power increases. In addition, the fractal dimensions of the ZnO thin films are also presented.en_US
dc.language.isoen_USen_US
dc.titleNanotribology and fractal analysis of ZnO thin films using scanning probe microscopyen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/0022-3727/36/7/317en_US
dc.identifier.journalJOURNAL OF PHYSICS D-APPLIED PHYSICSen_US
dc.citation.volume36en_US
dc.citation.issue7en_US
dc.citation.spage878en_US
dc.citation.epage883en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000182586400018-
dc.citation.woscount13-
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