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dc.contributor.authorTang, TWen_US
dc.contributor.authorLi, YMen_US
dc.date.accessioned2014-12-08T15:41:42Z-
dc.date.available2014-12-08T15:41:42Z-
dc.date.issued2002-12-01en_US
dc.identifier.issn1536-125Xen_US
dc.identifier.urihttp://dx.doi.org/10.1109/TNANO.2002.807389en_US
dc.identifier.urihttp://hdl.handle.net/11536/28358-
dc.description.abstractA SPICE-compatible charge model for nanoscale MOSFETs is proposed. Based on the solution of Schrodinger-Poisson (S-P) equations, the developed compact charge model is optimized with respect to: 1) the position of the charge concentration peak; 2) the maximum of the charge concentration; 3) the total inversion charge sheet density; and 4) the average inversion charge depth, respectively. This model can predict inversion layer electron density for various oxide thicknesses and applied voltages. Compared to the S-P results, our model prediction is within 5% of accuracy. Application of this charge quantization model to the C-V measurement produces an excellent agreement., This compact model has continuous derivatives and is therefore amenable,to a device simulator. It can also be easily incorporated into circuit simulator for modeling ultrathin oxide MOSFET C-V characteristics.en_US
dc.language.isoen_USen_US
dc.subjectC-V curveen_US
dc.subjectcompact charge modelen_US
dc.subjectdevice and circuit simulationen_US
dc.subjectMOSFETsen_US
dc.subjectquantum correctionen_US
dc.subjectSchrodinger-Poissonen_US
dc.titleA SPICE-compatible model for nanoscale MOSFET capacitor simulation under the inversion conditionen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1109/TNANO.2002.807389en_US
dc.identifier.journalIEEE TRANSACTIONS ON NANOTECHNOLOGYen_US
dc.citation.volume1en_US
dc.citation.issue4en_US
dc.citation.spage243en_US
dc.citation.epage246en_US
dc.contributor.department友訊交大聯合研發中心zh_TW
dc.contributor.departmentD Link NCTU Joint Res Ctren_US
dc.identifier.wosnumberWOS:000182374000014-
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