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dc.contributor.authorWang, JCen_US
dc.contributor.authorChiao, SHen_US
dc.contributor.authorLee, CLen_US
dc.contributor.authorLei, TFen_US
dc.contributor.authorLin, YMen_US
dc.contributor.authorWang, MFen_US
dc.contributor.authorChen, SCen_US
dc.contributor.authorYu, CHen_US
dc.contributor.authorLiang, MSen_US
dc.date.accessioned2014-12-08T15:41:51Z-
dc.date.available2014-12-08T15:41:51Z-
dc.date.issued2002-10-01en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.1498964en_US
dc.identifier.urihttp://hdl.handle.net/11536/28464-
dc.description.abstractThis work studies and presents an inner-interface trapping physical model for the ultra-thin (effective oxide thickness=15 Angstrom) zirconium oxide (ZrO2) film to explain its hysteresis phenomenon. The shift of the capacitance-voltage characteristics swept from accumulation to inversion and then swept back with light illumination is about 110 mV, which is larger than the shift without light illumination (similar to45 mV). The mobile ion effect is obviated using bias-temperature stress measurement. The proposed model successfully explains not only the phenomenon but also the thickness effect for the capacitance-voltage characteristics and the different turn-around voltages of the current density-voltage characteristics of the zirconium dielectrics. (C) 2002 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleA physical model for the hysteresis phenomenon of the ultrathin ZrO2 filmen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.1498964en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume92en_US
dc.citation.issue7en_US
dc.citation.spage3936en_US
dc.citation.epage3940en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000178087600078-
dc.citation.woscount60-
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