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dc.contributor.authorKer, MDen_US
dc.contributor.authorChang, CYen_US
dc.date.accessioned2014-12-08T15:42:19Z-
dc.date.available2014-12-08T15:42:19Z-
dc.date.issued2002-06-01en_US
dc.identifier.issn0026-2714en_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0026-2714(02)00049-5en_US
dc.identifier.urihttp://hdl.handle.net/11536/28745-
dc.description.abstractESD protection design for CMOS RF integrated circuits is proposed in this paper by using the stacked polysilicon diodes as the input ESD protection devices to reduce the total input capacitance and to avoid the noise coupling from the common substrate. The ESD level of the stacked polysilicon diodes on the I/O pad is restored by using the turn-on efficient power-rail ESD clamp circuit, which is constructed by substrate-triggered technique. This polysilicon diode is fully process compatible to general sub-quarter-micron CMOS processes. (C) 2002 Elsevier Science Ltd. All rights reserved.en_US
dc.language.isoen_USen_US
dc.titleESD protection design for CMOS RF integrated circuits using polysilicon diodesen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/S0026-2714(02)00049-5en_US
dc.identifier.journalMICROELECTRONICS RELIABILITYen_US
dc.citation.volume42en_US
dc.citation.issue6en_US
dc.citation.spage863en_US
dc.citation.epage872en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000176804000011-
dc.citation.woscount10-
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