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dc.contributor.authorWang, YKen_US
dc.contributor.authorTseng, TYen_US
dc.contributor.authorLin, Pen_US
dc.date.accessioned2014-12-08T15:42:23Z-
dc.date.available2014-12-08T15:42:23Z-
dc.date.issued2002-05-20en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.1480099en_US
dc.identifier.urihttp://hdl.handle.net/11536/28785-
dc.description.abstractHighly (110)-oriented Pb(Zr0.53Ti0.47)O-3 (PZT) films were deposited on SrRuO3 (SRO)/Ru/SiO2/Si substrates using a sol-gel method, in which SrRuO3 films were deposited at various substrate temperatures. The crystallinity of the PZT films was improved after the annealing process. The leakage current, dielectric constant, and polarization versus electric-field characteristics of PZT films were strongly dependent on the annealing and deposition temperatures of the SRO films. The 650 degreesC annealed PZT film grown on SRO has a leakage current of 9x10(-7) A/cm(2) at an applied field of 500 kV/cm, dielectric constant of 1306, remanent polarization (P-r) of 40.1 muC/cm(2) and coercive field (E-c) of 78.5 kV/cm at an applied voltage of 5 V. The PZT films indicated fatigue-free characteristics up to similar to1.0x10(12) switching cycles under 5 V bipolar pulse. (C) 2002 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleEnhanced ferroelectric properties of Pb(Zr0.53Ti0.47)O-3 thin films on SrRuO3/Ru/SiO2/Si substratesen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.1480099en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume80en_US
dc.citation.issue20en_US
dc.citation.spage3790en_US
dc.citation.epage3792en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000175564100042-
dc.citation.woscount61-
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