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dc.contributor.authorKer, MDen_US
dc.contributor.authorChen, TYen_US
dc.contributor.authorWu, CYen_US
dc.date.accessioned2014-12-08T15:42:25Z-
dc.date.available2014-12-08T15:42:25Z-
dc.date.issued2002-05-01en_US
dc.identifier.issn0038-1101en_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0038-1101(01)00317-3en_US
dc.identifier.urihttp://hdl.handle.net/11536/28805-
dc.description.abstractNe electrostatic discharge (ESD) clamp devices for using in power-rail ESD clamp circuits with the substrate-triggered technique ire proposed to improve ESD level in a limited silicon area. The parasitic n-p-n and p-n-p bipolar junction transistors (BJTs) in the CMOS devices ire used to form the substrate-triggered devices Cor ESD protection. Four substrate-triggered de-ices are proposed and investigated in this work, which are named as the substrate-triggered lateral BJT, the substrate-triggered vertical BJT, the substrate-triggered double BJT and the double-triggered double BJT. An RC-based ESD-detection Circuit Is used to generate the triggering Current to turn on the proposed substrate-triggered devices. In order to trigger on the parasitic bipolar transistors more effectively, the symmetric multiple-cell square-type layout method is used to realize these substrate-triggered devices. The power-rail ESD clamp circuits, with such substrate-triggered devices have been fabricated in a 0.6-mum CMOS process. Experimental results have shown that the substrate-triggered device with double-BJT Structure can provide 200%, higher ESD robustness in per silicon area, as compared to the NMOS with the traditional gate-driven design, (C) 2002 Elsevier Science Ltd. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectelectrostatic dischargeen_US
dc.subjectsubstrate-triggered techniqueen_US
dc.subjectelectrostatic discharge clamp circuiten_US
dc.subjectsecondary breakdown current (lt(2))en_US
dc.subjectbipolar junction transistoren_US
dc.titleSubstrate-triggered ESD clamp devices for use in power-rail ESD clamp circuitsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/S0038-1101(01)00317-3en_US
dc.identifier.journalSOLID-STATE ELECTRONICSen_US
dc.citation.volume46en_US
dc.citation.issue5en_US
dc.citation.spage721en_US
dc.citation.epage734en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000175658000019-
dc.citation.woscount10-
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