SiCl3CCl3 as a novel precursor for chemical vapor deposition of amorphous carbon films.

標題:	SiCl3CCl3 as a novel precursor for chemical vapor deposition of amorphous carbon films.
作者:	Chiu, HT Chang, YH Wang, LS Peng, CW Lee, CY 應用化學系 Department of Applied Chemistry
公開日期:	7-四月-2002
URI:	http://hdl.handle.net/11536/28864
ISSN:	0065-7727
期刊:	ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY
Volume:	223
Issue:
起始頁:	A48
結束頁:	A48
顯示於類別：	期刊論文