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dc.contributor.authorLee, WYen_US
dc.contributor.authorChien, JYen_US
dc.contributor.authorWang, DPen_US
dc.contributor.authorHuang, KFen_US
dc.contributor.authorHuang, TCen_US
dc.date.accessioned2014-12-08T15:42:31Z-
dc.date.available2014-12-08T15:42:31Z-
dc.date.issued2002-04-01en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.1453492en_US
dc.identifier.urihttp://hdl.handle.net/11536/28874-
dc.description.abstractPhotoreflectance (PR) of surface-intrinsic-n(+) type doped GaAs has been measured for various power densities of pump laser. The spectra exhibited many Franz-Keldysh oscillations, whereby the strength of electric field F in the undoped layer can be determined. The thus obtained Fs are subject to photovoltaic effect and are less than built-in field F-bi. In the previous work we have obtained the relation Fapproximate toF(bi)-deltaF/2 when deltaF<F-bi by using electroreflectance to simulate PR, where deltaF is the modulating field of the pump beam. In this work a method was devised to evaluate deltaF by using photoinduced voltages V-s and, hence, the relation can be verified by PR itself. The deltaFs obtained by V-s are also consistent with those of using imaginary part of fast Fourier transform of PR spectra. (C) 2002 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleEvaluation of modulating field of photoreflectance of surface-intrinsic-n(+) type doped GaAs by using photoinduced voltageen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.1453492en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume91en_US
dc.citation.issue7en_US
dc.citation.spage4101en_US
dc.citation.epage4104en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000174663900020-
dc.citation.woscount0-
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