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dc.contributor.authorSu, JGen_US
dc.contributor.authorWong, SCen_US
dc.contributor.authorChang, CYen_US
dc.date.accessioned2014-12-08T15:42:33Z-
dc.date.available2014-12-08T15:42:33Z-
dc.date.issued2002-04-01en_US
dc.identifier.issn0038-1101en_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0038-1101(01)00319-7en_US
dc.identifier.urihttp://hdl.handle.net/11536/28886-
dc.description.abstractIn recent times, CMOS devices have played an increasing important role in the area of RF-ICs to implement part of the high-frequency circuits. As a result, the high-frequency characteristics of CMOS devices, including stability, should be investigated in-depth. In the design of RF amplifier, the consideration to avoid oscillation in the circuits is a must. Basically, the instability involved in designing RF circuits can be reduced if the transistor is stable in the interesting frequency region. In this study, the stability factor of CMOS device is discussed. First, the stability factor (i.e. k-factor) is derived based on the microwave small-signal model of MOSFET. Therefore, small-signal parameters that affect stability can be carefully examined. In addition, the effects of biasing and dimensions on k-factor are also discussed. Since various operating point (or biasing) can cause device to have different effects on high frequency, the correlation between biasing and stability is discussed in this study. Due to the fact that CMOS device has continuously shrunk in size, a detailed discussion of the effect of MOSFETs dimension on stability is included. It is found from our experimental results that the smaller the gate length, the greater is the frequency range for CMOS device to become potentially unstable. (C) 2002 Elsevier Science Ltd. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectRF-ICsen_US
dc.subjectCMOSen_US
dc.subjectstability factoren_US
dc.subjectRF ampliferen_US
dc.titleAn investigation on RF CMOS stability related to bias and scalingen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/S0038-1101(01)00319-7en_US
dc.identifier.journalSOLID-STATE ELECTRONICSen_US
dc.citation.volume46en_US
dc.citation.issue4en_US
dc.citation.spage451en_US
dc.citation.epage458en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000175546200001-
dc.citation.woscount4-
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