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dc.contributor.authorSu, HDen_US
dc.contributor.authorChiou, BSen_US
dc.contributor.authorLu, PCen_US
dc.contributor.authorChang, MHen_US
dc.contributor.authorLee, KHen_US
dc.contributor.authorChao, CPen_US
dc.contributor.authorSee, YCen_US
dc.contributor.authorSung, JYCen_US
dc.date.accessioned2014-12-08T15:43:06Z-
dc.date.available2014-12-08T15:43:06Z-
dc.date.issued2002-01-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://hdl.handle.net/11536/29157-
dc.description.abstractIn deep sub-micron technology, leakage current of the oxide layer has a severe impact on chip power consumption due to the scaling down of oxide thickness. The inverter circuit model proposed in this paper provides a simple and quick method of predicting chip standby current. This model takes into account both the conventional device-off current and the inversion gate current, as compared to the conventional approach in which the gate leakage current is small and neglected. The temperature dependence study shows that the logarithm of the device-off current is inversely proportional to temperature. From 25 C, the device-off current increases tenfold for a temperature increase of 50 C, while the inversion gate current is almost temperature independent. Hence, a more aggressive oxide scaling rule could be employed in high-performance products operated at higher temperatures under the same device-off current/inversion gate current ratio.en_US
dc.language.isoen_USen_US
dc.subjectultrathin oxideen_US
dc.subjectinverteren_US
dc.subjectgate currenten_US
dc.subjectstandby currenten_US
dc.subjecttemperature dependenceen_US
dc.titleNovel chip standby current prediction model and ultrathin gate oxide scaling limiten_US
dc.typeArticleen_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.citation.volume41en_US
dc.citation.issue1en_US
dc.citation.spage59en_US
dc.citation.epage65en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000173882300012-
dc.citation.woscount2-
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