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dc.contributor.authorTsai, CLen_US
dc.contributor.authorChen, CFen_US
dc.contributor.authorLin, CLen_US
dc.date.accessioned2014-12-08T15:43:13Z-
dc.date.available2014-12-08T15:43:13Z-
dc.date.issued2001-11-01en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.1408587en_US
dc.identifier.urihttp://hdl.handle.net/11536/29256-
dc.description.abstractWe synthesized phosphorus-doped and boron-doped emitters by using trimethylphosphite P(OCH3)(3) and trimethylborate B(OCH3)(3) as doping sources in a microwave plasma chemical vapor deposition system. Based on our experimental results from scanning electron microscopy and Raman spectra, there is much difference among undoped, phosphorus-doped, and boron-doped diamondlike material. In addition, doping both phosphorus and boron can enhance electric properties by reducing the turn-on voltage and can increase the emission current density. The turn-on voltages of undoped, boron-doped, and phosphorus-doped emitters in triode-type field emitter arrays are 15, 8, and 5 V, respectively. The emission currents of boron-doped and phosphorus-doped emitters are about 20 and 80 times larger than the undoped. (C) 2001 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleCharacterization of phosphorus-doped and boron-doped diamond-like carbon emitter arraysen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.1408587en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume90en_US
dc.citation.issue9en_US
dc.citation.spage4847en_US
dc.citation.epage4851en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000171594800079-
dc.citation.woscount14-
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