完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Tsai, CL | en_US |
dc.contributor.author | Chen, CF | en_US |
dc.contributor.author | Lin, CL | en_US |
dc.date.accessioned | 2014-12-08T15:43:13Z | - |
dc.date.available | 2014-12-08T15:43:13Z | - |
dc.date.issued | 2001-11-01 | en_US |
dc.identifier.issn | 0021-8979 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1063/1.1408587 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/29256 | - |
dc.description.abstract | We synthesized phosphorus-doped and boron-doped emitters by using trimethylphosphite P(OCH3)(3) and trimethylborate B(OCH3)(3) as doping sources in a microwave plasma chemical vapor deposition system. Based on our experimental results from scanning electron microscopy and Raman spectra, there is much difference among undoped, phosphorus-doped, and boron-doped diamondlike material. In addition, doping both phosphorus and boron can enhance electric properties by reducing the turn-on voltage and can increase the emission current density. The turn-on voltages of undoped, boron-doped, and phosphorus-doped emitters in triode-type field emitter arrays are 15, 8, and 5 V, respectively. The emission currents of boron-doped and phosphorus-doped emitters are about 20 and 80 times larger than the undoped. (C) 2001 American Institute of Physics. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Characterization of phosphorus-doped and boron-doped diamond-like carbon emitter arrays | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.1408587 | en_US |
dc.identifier.journal | JOURNAL OF APPLIED PHYSICS | en_US |
dc.citation.volume | 90 | en_US |
dc.citation.issue | 9 | en_US |
dc.citation.spage | 4847 | en_US |
dc.citation.epage | 4851 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.identifier.wosnumber | WOS:000171594800079 | - |
dc.citation.woscount | 14 | - |
顯示於類別: | 期刊論文 |