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dc.contributor.authorChou, SYen_US
dc.contributor.authorLou, JCen_US
dc.contributor.authorChen, LJen_US
dc.contributor.authorShiu, LHen_US
dc.contributor.authorLiu, RGen_US
dc.contributor.authorWang, CMen_US
dc.contributor.authorGau, TSen_US
dc.date.accessioned2014-12-08T15:43:18Z-
dc.date.available2014-12-08T15:43:18Z-
dc.date.issued2001-11-01en_US
dc.identifier.issn1071-1023en_US
dc.identifier.urihttp://dx.doi.org/10.1116/1.1418398en_US
dc.identifier.urihttp://hdl.handle.net/11536/29301-
dc.description.abstractThe mechanism of focus latitude enhancement for contact/via hole printing is explained by approximating the axis intensity distribution of an image as a series of cosine functions to characterize the interference between each pair of diffraction beams. It is found that a phase-shifting mask (PSM) with symmetrical assist features improves the depth of focus (DOF) by introducing destructive interference to counterbalance the intensity fluctuation from constructive interference as defocus. A simple formula was derived to represent the capability of focus latitude enlargement. It shows that the extent of enhancement depends on the exposure wavelength and numerical aperture of a projection lens only. Increasing the degree of partial coherence degrades the focal range enlargement because a larger illumination angle elongates the destructive interference pattern in the optical-axis direction to weaken its ability for intensity compensation. On the other hand, the lack of constructive interference in dense hole imaging fails the mask pattern transfer, which limits the application of the phase-shifting method to pattern pitch greater than root2lambda/NA. A tiny amount of spherical aberration results in prominent asymmetrical defocus behavior because the wave deformation in the projection lens shifts the distribution of constructive and destructive interference patterns to opposite defocus directions. The printing characteristics of 0.17 mum contact using an 18% transmission, rim-type attenuated phase-shifting mask are investigated to corroborate our analysis of defocus behavior. The dependence of depth of focus on pattern duty is stressed to elucidate the difference in mechanisms of focus latitude improvements for a sparse hole and periodic dense hole. (C) 2001 American Vacuum Society.en_US
dc.language.isoen_USen_US
dc.titleFocus latitude enhancement of symmetrical phase mask design for deep submicron contact hole patterningen_US
dc.typeArticleen_US
dc.identifier.doi10.1116/1.1418398en_US
dc.identifier.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ben_US
dc.citation.volume19en_US
dc.citation.issue6en_US
dc.citation.spage2195en_US
dc.citation.epage2205en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000173159900032-
dc.citation.woscount1-
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