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dc.contributor.authorLee, WHen_US
dc.contributor.authorLin, JCen_US
dc.contributor.authorLee, Cen_US
dc.contributor.authorCheng, HCen_US
dc.contributor.authorYew, TRen_US
dc.date.accessioned2014-12-08T15:43:18Z-
dc.date.available2014-12-08T15:43:18Z-
dc.date.issued2001-11-01en_US
dc.identifier.issn0925-9635en_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0925-9635(01)00482-4en_US
dc.identifier.urihttp://hdl.handle.net/11536/29313-
dc.description.abstractElectron cyclotron resonance chemical vapor deposition (ECR-CVD) of SiC films from silane and methane gas mixtures at low temperature has been investigated using two different carrier gases, namely, argon and hydrogen. The results obtained are compared. The chemical composition and crystalline microstructure were investigated by Fourier transform infrared spectroscopy (FTIR) and cross-sectional transmission electron microscopy (XTEM), respectively. The results indicate that the carrier gases have a greater influence on the film composition and microstructure as compared to the growth parameters like pressure, power and flow ratio. The deposition mechanism which controls the film characteristics is also presented. (C) 2001 Elsevier Science B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectchemical vapor depositionsen_US
dc.subjectelectron cyclotron resonanceen_US
dc.subjectsilicon carbideen_US
dc.subjecttransmission electron microscopyen_US
dc.titleA comparative study of Ar and H-2 as carrier gases for the growth of SiC films on Si(100) by electron cyclotron resonance chemical vapor deposition at low temperatureen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/S0925-9635(01)00482-4en_US
dc.identifier.journalDIAMOND AND RELATED MATERIALSen_US
dc.citation.volume10en_US
dc.citation.issue11en_US
dc.citation.spage2075en_US
dc.citation.epage2083en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000171738400021-
dc.citation.woscount9-
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