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dc.contributor.authorChung, HMen_US
dc.contributor.authorPan, YCen_US
dc.contributor.authorChuang, WCen_US
dc.contributor.authorChen, NCen_US
dc.contributor.authorTsai, CCen_US
dc.contributor.authorLee, MCen_US
dc.contributor.authorChen, WHen_US
dc.contributor.authorChen, WKen_US
dc.date.accessioned2014-12-08T15:43:23Z-
dc.date.available2014-12-08T15:43:23Z-
dc.date.issued2001-10-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://hdl.handle.net/11536/29371-
dc.description.abstractWe have measured the dynamic response of the photocapacitance of a Schottky diode made of an undoped GaN epilayer grown by metalorganic vapor phase epitaxy. The measurements were performed after the suspension of a white light for a specified "waiting" time, t. The results indicate that the capacitance exhibits a logarithmic function of t from which a time constant of approximately 34.5 s and a cross-sectional area of less than 2.89 x 10(-27) cm(2) were retrieved. These are interpreted as the characteristic time and the cross-sectional area of electron capture by the traps associated with dislocations formed in the epifilm, respectively.en_US
dc.language.isoen_USen_US
dc.subjectGaNen_US
dc.subjectphotocapacitanceen_US
dc.subjectlogarithmicen_US
dc.subjectdecayen_US
dc.subjectdislocationsen_US
dc.subjectMOVPEen_US
dc.titleLong-term photocapacitance decay behavior in undoped GaNen_US
dc.typeArticleen_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.citation.volume40en_US
dc.citation.issue10en_US
dc.citation.spage5871en_US
dc.citation.epage5874en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000172306500007-
dc.citation.woscount4-
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