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dc.contributor.authorChang, KMen_US
dc.contributor.authorChung, YHen_US
dc.contributor.authorChen, HYen_US
dc.contributor.authorLee, TCen_US
dc.contributor.authorSun, YLen_US
dc.date.accessioned2014-12-08T15:43:23Z-
dc.date.available2014-12-08T15:43:23Z-
dc.date.issued2001-10-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://hdl.handle.net/11536/29372-
dc.description.abstractIn this paper, the thickness and the stress polarity effects on the reliability of the low thermal budget polyoxides are investigated. The polyoxides are prepared by two methods: the low-temperature tetraethylorthosilicate (TEOS) polyoxide deposition and in the rapid thermal chamber in N2O ambient (RTN2O). It is observed that the thinner TEOS polyoxides exhibit higher charge to breakdown (Q(bd)) and larger stress polarity effect than those of the thicker TEOS polyoxides. However, for the RTN2O grown polyoxides from 8.5 nm to 12.9 run, they have the similar values of the Qbd and the stress polarity effects, The nitrogen atoms incorporated in the RTN2O grown polyoxides may be the reason to this less thickness dependence of the Q(bd). Higher barrier height is also observed for the RTN2O grown polyoxides than that of the deposited TEOS polyoxide to obtain a lower tunneling current under a fixed electric field.en_US
dc.language.isoen_USen_US
dc.subjectlow thermal budget polyoxidesen_US
dc.subjecttetraethylorthosilicate (TEOS)en_US
dc.subjectbarrier heighten_US
dc.titleThickness and stress polarity effects on the reliability of the low thermal budget polyoixdesen_US
dc.typeArticleen_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.citation.volume40en_US
dc.citation.issue10en_US
dc.citation.spage5875en_US
dc.citation.epage5879en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000172306500008-
dc.citation.woscount0-
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