Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Huang, CY | en_US |
dc.contributor.author | Teng, TH | en_US |
dc.contributor.author | Yang, CJ | en_US |
dc.contributor.author | Tseng, CH | en_US |
dc.contributor.author | Cheng, HC | en_US |
dc.date.accessioned | 2014-12-08T15:44:00Z | - |
dc.date.available | 2014-12-08T15:44:00Z | - |
dc.date.issued | 2001-04-01 | en_US |
dc.identifier.issn | 0021-4922 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1143/JJAP.40.L316 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/29746 | - |
dc.description.abstract | This work investigates the temperature and illumination effects on the a-SM thin-film transistors (a-SiH TFTs) under AC gate bias stress to find the larger threshold voltage shift and subthreshold swing change for the bias-temperature-stress (BTS) and bias-illumination-stress (BIS). Excess carriers from thermal-generation electron-hole pairs or photoexcited electron-hole pairs may significantly influence the instability of a-SM TFTs during bias stress. The instability mechanisms originate from the carrier-induced defect Creation enhanced by thermal generation in the BTS case and also emphasized by photoexcitation for the BIS case. Both stress conditions will induce a larger threshold voltage shift and higher cutoff frequency than those for simple bias stresses. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | a-Si : H TFTs | en_US |
dc.subject | AC | en_US |
dc.subject | bias-temperature-stress | en_US |
dc.subject | bias-illumination-stress | en_US |
dc.title | Effect of temperature and illumination on the instability of a-Si : H thin-film transistors under AC gate bias stress | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1143/JJAP.40.L316 | en_US |
dc.identifier.journal | JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | en_US |
dc.citation.volume | 40 | en_US |
dc.citation.issue | 4A | en_US |
dc.citation.spage | L316 | en_US |
dc.citation.epage | L318 | en_US |
dc.contributor.department | 奈米中心 | zh_TW |
dc.contributor.department | Nano Facility Center | en_US |
dc.identifier.wosnumber | WOS:000170777200005 | - |
dc.citation.woscount | 5 | - |
Appears in Collections: | Articles |
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