THICKNESS DETERMINATION OF POLY-SI/POLY-OXIDE POLY-SI/SIO2/SI STRUCTURE BY ELLIPSOMETER

標題:	THICKNESS DETERMINATION OF POLY-SI/POLY-OXIDE POLY-SI/SIO2/SI STRUCTURE BY ELLIPSOMETER
作者:	CHAO, TS LEE, CL LEI, TF 電控工程研究所 Institute of Electrical and Control Engineering
關鍵字:	MEASUREMENT;THIN FILMS;ELLIPSOMETRY
公開日期:	24-六月-1993
摘要:	An ellipsometry measurement method is proposed to measure the poly-Si/poly-oxide/poly-Si/SiO2/Si structure. The thickness of each layer in this structure can be easily obtained by a conventional ellipsometry measurement. The measured result is consistent with that of cross-sectional TEM.
URI:	http://hdl.handle.net/11536/2977
ISSN:	0013-5194
期刊:	ELECTRONICS LETTERS
Volume:	29
Issue:	13
起始頁:	1157
結束頁:	1159
顯示於類別：	期刊論文

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