Title: The effect of the growth temperature on polyoxide by rapid thermal processing
Authors: Chang, KM
Lee, TC
Sun, YL
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
Keywords: oxynitridation;polyoxide;polysilicon;gate voltage shift;charge-to-breakdown
Issue Date: 1-Mar-2001
Abstract: A rapid thermal oxynitridation process using N2O gas as the oxidant has been developed. Due to a smoother polyoxide/polysilicon interface, polyoxide grown by rapid thermal processing has better reliability than that of polyoxide grown by a conventional furnace. Moreover, in order to explore the effects of growth temperature on polyoxides, polyoxides were grown at different temperatures in this study. From this work, we find that polyoxide grown at low temperatures has better reliability than polyoxides grown at high temperature and exhibits improved characteristics such as higher breakdown electric field, less gate voltage shift, and larger charger-to-breakdown.
URI: http://dx.doi.org/10.1143/JJAP.40.1157
http://hdl.handle.net/11536/29823
ISSN: 0021-4922
DOI: 10.1143/JJAP.40.1157
Journal: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume: 40
Issue: 3A
Begin Page: 1157
End Page: 1161
Appears in Collections:Articles


Files in This Item:

  1. 000170771500001.pdf

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.