Full metadata record
DC FieldValueLanguage
dc.contributor.authorChen, FRen_US
dc.contributor.authorIchnose, Hen_US
dc.contributor.authorKai, JJen_US
dc.contributor.authorChang, Len_US
dc.date.accessioned2014-12-08T15:44:19Z-
dc.date.available2014-12-08T15:44:19Z-
dc.date.issued2001en_US
dc.identifier.issn0022-0744en_US
dc.identifier.urihttp://hdl.handle.net/11536/29922-
dc.identifier.urihttp://dx.doi.org/10.1093/jmicro/50.6.529en_US
dc.description.abstractA generalized maximum entropy method coupled with Gerchberg-Saxton algorithm has been developed to extend the resolution from high-resolution TEM image(s) for weak objects. The Gerchberg-Saxton algorithm restores spatial resolution by operating real space and reciprocal space projections cyclically. in our methodology, a generalized maximum entropy method (Kullback-Leibler cross entropy) dealing with weak objects is used as a real space (P1) projection. After P1 projection, not only are the phases within the input spatial frequencies improved, but also the phases in the next higher frequencies are extrapolated. An example of semi-blind deconvolution (P1 project only) to improve the resolution in SiC twin boundary is shown. The nature of the bonding in this twin boundary is Si-C but it was rotated 180degrees along the boundary normal. The optimum solution from P1 projection can be further improved by a P2 projection. The square roots of diffraction intensities from a diffraction pattern are then substituted to complete a cycle operation of the Gerchberg-Saxton algorithm. Application examples of Gerchberg-Saxton algorithm to solve the atomic structure of defects (2 x 1 interfacial reconstruction and dislocation) in NiSi2 / Si interfaces will be shown also.en_US
dc.language.isoen_USen_US
dc.subjectresolution extensionen_US
dc.subjectmaximum entropy deconvolution methoden_US
dc.subjectGerchberg-Saxton algorithmen_US
dc.subjectinterface and grain boundary structureen_US
dc.titleExtension of HRTEM resolution by semi-blind deconvolution method and Gerchberg-Saxton algorithm: application to grain boundary and interfaceen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1093/jmicro/50.6.529en_US
dc.identifier.journalJOURNAL OF ELECTRON MICROSCOPYen_US
dc.citation.volume50en_US
dc.citation.issue6en_US
dc.citation.spage529en_US
dc.citation.epage540en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000173995200016-
Appears in Collections:Conferences Paper


Files in This Item:

  1. 000173995200016.pdf

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.