Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Wang, Sheng-Yu | en_US |
dc.contributor.author | Tsai, Chen-Han | en_US |
dc.contributor.author | Lee, Dai-Ying | en_US |
dc.contributor.author | Lin, Chih-Yang | en_US |
dc.contributor.author | Lin, Chun-Chieh | en_US |
dc.contributor.author | Tseng, Tseung-Yuen | en_US |
dc.date.accessioned | 2014-12-08T15:44:21Z | - |
dc.date.available | 2014-12-08T15:44:21Z | - |
dc.date.issued | 2011-07-01 | en_US |
dc.identifier.issn | 0167-9317 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1016/j.mee.2010.11.058 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/29953 | - |
dc.description.abstract | In this study, we have investigated the effect of current compliance during forming process on resistive switching (RS) characteristics of the Ti/ZrO(2)/Pt device. The higher the current compliance is, the larger RS operation voltage is needed. The Ti/ZrO(2)/Pt device with high device yield can be operated over 10,000 RS cycles by sweeping dc voltage. and the on and off two memory states exhibit good stability under 0.3 V stress voltage. Moreover, the data retention of both memory states is over 10(5) s. As applying +6-V 10-ns and -3-V 10-ns voltage pulses on the device, there are operation errors observed during continuous write-read-erase-read cycles until increasing the pulse width to 50 ns. Nondestructive readout tests are also performed on the Ti/ZrO(2)/Pt device before and after 10(3) pulse cycles without any obvious degradation observed. Compared with reported ZrO(2)-based memory devices, our Ti/ZrO(2)/Pt device exhibits better RS properties and has a high potential for memory application. (C) 2011 Elsevier B.V. All rights reserved. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Improved resistive switching properties of Ti/ZrO(2)/Pt memory devices for RRAM application | en_US |
dc.type | Article; Proceedings Paper | en_US |
dc.identifier.doi | 10.1016/j.mee.2010.11.058 | en_US |
dc.identifier.journal | MICROELECTRONIC ENGINEERING | en_US |
dc.citation.volume | 88 | en_US |
dc.citation.issue | 7 | en_US |
dc.citation.spage | 1628 | en_US |
dc.citation.epage | 1632 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
Appears in Collections: | Conferences Paper |