標題: | Field-emission properties of aligned carbon nanotubes |
作者: | Hong, WK Shih, HC Tsai, SH Shu, CT Tarntair, FG Cheng, HC 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | field-emission;aligned carbon nanotubes;bias-enhanced microwave plasma chemical vapor deposition |
公開日期: | 15-九月-2000 |
摘要: | Dense, well-separated, and aligned carbon nanotubes have been prepared via bias-enhanced microwave plasma chemical vapor deposition. The turn-on fields defined at the emission current density of 10 mu A/cm(2) are about 3.35 V/mu m, 2.54 V/mu m, and 3.54V/mu m, for the immersion times in PdCl2 of 1 min, 20 min, and 40 min,respectively. The corresponding emission current densities are about 0.97 mA/cm(2), 4.5 mA/cm(2), and 0.44 mA/cm(2) at the electric field of 5 V/mu m. The higher emission current obtained from the aligned carbon nanotubes for the immersion time of 20 min is ascribed to the denser and sharper nanotubes formed in this condition. |
URI: | http://dx.doi.org/10.1143/JJAP.39.L925 http://hdl.handle.net/11536/30252 |
ISSN: | 0021-4922 |
DOI: | 10.1143/JJAP.39.L925 |
期刊: | JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS |
Volume: | 39 |
Issue: | 9AB |
起始頁: | L925 |
結束頁: | L928 |
顯示於類別: | 期刊論文 |