RHEED intensity oscillations in homoepitaxial growth of SrTiO3 films

doi:10.1016/S0921-4526(99)02981-6

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DC 欄位	值	語言
dc.contributor.author	Lee, JY	en_US
dc.contributor.author	Juang, JY	en_US
dc.contributor.author	Ou, JH	en_US
dc.contributor.author	Chen, YF	en_US
dc.contributor.author	Wu, KH	en_US
dc.contributor.author	Uen, TM	en_US
dc.contributor.author	Gou, YS	en_US
dc.date.accessioned	2014-12-08T15:45:06Z	-
dc.date.available	2014-12-08T15:45:06Z	-
dc.date.issued	2000-07-01	en_US
dc.identifier.issn	0921-4526	en_US
dc.identifier.uri	http://dx.doi.org/10.1016/S0921-4526(99)02981-6	en_US
dc.identifier.uri	http://hdl.handle.net/11536/30415	-
dc.description.abstract	The amplitude and periodicity of the reflection high-energy electron diffraction (RHEED) oscillations displayed strong temperature dependence in homoepitaxy of SrTiO3(STO) films. Combining with the AFM observations, the results suggest that the oscillations are not directly related to the layer-by-layer growth. (C) 2000 Elsevier Science B.V. All rights reserved.	en_US
dc.language.iso	en_US	en_US
dc.subject	homoepitaxial SrTiO3 thin film	en_US
dc.subject	RHEED	en_US
dc.subject	epitaxial growth	en_US
dc.subject	atomic force microscopy	en_US
dc.title	RHEED intensity oscillations in homoepitaxial growth of SrTiO3 films	en_US
dc.type	Article; Proceedings Paper	en_US
dc.identifier.doi	10.1016/S0921-4526(99)02981-6	en_US
dc.identifier.journal	PHYSICA B	en_US
dc.citation.volume	284	en_US
dc.citation.issue		en_US
dc.citation.spage	2099	en_US
dc.citation.epage	2100	en_US
dc.contributor.department	電子物理學系	zh_TW
dc.contributor.department	Department of Electrophysics	en_US
dc.identifier.wosnumber	WOS:000087423100487	-
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