HYDROGEN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM DODECAMETHYLCYCLOHEXASILANE

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	CHIU, HT	en_US
dc.contributor.author	HUANG, SC	en_US
dc.date.accessioned	2014-12-08T15:04:33Z	-
dc.date.available	2014-12-08T15:04:33Z	-
dc.date.issued	1993-04-15	en_US
dc.identifier.issn	0261-8028	en_US
dc.identifier.uri	http://hdl.handle.net/11536/3049	-
dc.language.iso	en_US	en_US
dc.title	HYDROGEN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM DODECAMETHYLCYCLOHEXASILANE	en_US
dc.type	Article	en_US
dc.identifier.journal	JOURNAL OF MATERIALS SCIENCE LETTERS	en_US
dc.citation.volume	12	en_US
dc.citation.issue	8	en_US
dc.citation.spage	537	en_US
dc.citation.epage	539	en_US
dc.contributor.department	交大名義發表	zh_TW
dc.contributor.department	應用化學系	zh_TW
dc.contributor.department	National Chiao Tung University	en_US
dc.contributor.department	Department of Applied Chemistry	en_US
dc.identifier.wosnumber	WOS:A1993KZ35100005	-
dc.citation.woscount	9	-
顯示於類別：	期刊論文