| Title: | DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM DODECAMETHYLCYCLOHEXASILANE |
| Authors: | CHIU, HT LEE, SF 交大名義發表 應用化學系 National Chiao Tung University Department of Applied Chemistry |
| Issue Date: | 15-Nov-1991 |
| URI: | http://dx.doi.org/10.1007/BF00722649 http://hdl.handle.net/11536/3633 |
| ISSN: | 0261-8028 |
| DOI: | 10.1007/BF00722649 |
| Journal: | JOURNAL OF MATERIALS SCIENCE LETTERS |
| Volume: | 10 |
| Issue: | 22 |
| Begin Page: | 1323 |
| End Page: | 1325 |
| Appears in Collections: | Articles |
- HYDROGEN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM DODECAMETHYLCYCLOHEXASILANE / CHIU, HT;HUANG, SC
- DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM 1,1-DIMETHYL-1-SILACYCLOBUTANE / CHIU, HT;LEE, SF
- LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM ORGANOPOLYSILANES / CHIU, HT;WU, PF
- 以1,2-二甲基二矽烷經低溫化學氣相沉積成長碳化矽薄膜 / 胡力文;Hu,Li-Wen;裘性天;Chiu,Hsin-Tien
- LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM HEXAMETHYLDISILANE / CHIU, HT;HSU, JS
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