完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Huang, HT | en_US |
dc.contributor.author | Chen, MJ | en_US |
dc.contributor.author | Chen, JH | en_US |
dc.contributor.author | Su, CW | en_US |
dc.contributor.author | Hou, CS | en_US |
dc.contributor.author | Liang, MS | en_US |
dc.date.accessioned | 2014-12-08T15:45:26Z | - |
dc.date.available | 2014-12-08T15:45:26Z | - |
dc.date.issued | 2000-04-01 | en_US |
dc.identifier.issn | 0021-4922 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1143/JJAP.39.2026 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/30602 | - |
dc.description.abstract | The Monte Carlo sphere model is extended to deal with the extrinsic time-dependent-dielectric-breakdown (TCDB) by incorporating the well-known "effective oxide thinning" concept. Percolation simulation, based on this model for the first time, evidences that the process defects induced extrinsic TDDB is also statistical in nature as is the intrinsic one, and is characterized by a probability function defining local oxide thinning. The experimental bimodal or even multimodal characteristics can be reproduced accordingly. Furthermore, the simulation results in the extrinsic regime are found to be sample-size (i.e., the total number of samples that span the breakdown statistics) dependent, suggesting that care should be taken when evaluating the extrinsic TDDB data in a real manufacturing process. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | silicon | en_US |
dc.subject | CMOS | en_US |
dc.subject | oxide breakdown | en_US |
dc.subject | Monte Carte | en_US |
dc.subject | percolation | en_US |
dc.subject | extrinsic | en_US |
dc.subject | effective oxide thinning | en_US |
dc.title | Monte Carlo sphere model for effective oxide thinning induced extrinsic breakdown | en_US |
dc.type | Article; Proceedings Paper | en_US |
dc.identifier.doi | 10.1143/JJAP.39.2026 | en_US |
dc.identifier.journal | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | en_US |
dc.citation.volume | 39 | en_US |
dc.citation.issue | 4B | en_US |
dc.citation.spage | 2026 | en_US |
dc.citation.epage | 2029 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000088909300015 | - |
顯示於類別: | 會議論文 |