標題: A microstructure for in situ determination of residual strain
作者: Pan, CS
Hsu, WY
機械工程學系
Department of Mechanical Engineering
關鍵字: residual strain;thin film
公開日期: 1-六月-1999
摘要: This work presents a new strain sensor with a compact structure. The strain sensor comprises of a pair of cantilever beams with different lengths connected by a short tip. The residual strain causes two beams to deflect each other, thereby magnifying the deflection, which is measured by the tip. The displacement is independent of both Young's modulus and the film's thickness. An analytical model is derived to relate the measured displacement to residual strain. Finite-element modeling is also used to analyze the model. This work also thoroughly considers other factors that influence the designs and the implicit limitations of the strain sensors. Experimental results with an SiO2 film as well as undoped LPCVD polysilicon films are used to demonstrate the effectiveness of the proposed structure.
URI: http://dx.doi.org/10.1109/84.767116
http://hdl.handle.net/11536/31289
ISSN: 1057-7157
DOI: 10.1109/84.767116
期刊: JOURNAL OF MICROELECTROMECHANICAL SYSTEMS
Volume: 8
Issue: 2
起始頁: 200
結束頁: 207
顯示於類別:期刊論文


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