An intelligent supervisory system for ion implantation in IC fabrication processes

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DC 欄位	值	語言
dc.contributor.author	Shen, LC	en_US
dc.contributor.author	Hsu, PL	en_US
dc.date.accessioned	2014-12-08T15:46:55Z	-
dc.date.available	2014-12-08T15:46:55Z	-
dc.date.issued	1999-02-01	en_US
dc.identifier.issn	0967-0661	en_US
dc.identifier.uri	http://hdl.handle.net/11536/31525	-
dc.description.abstract	This pager presents a real-time intelligent supervision system for IC ion implantation processes. A hardware interface is developed, to extract the features directly from the 2-D analog image signals of a beam map. A qualitative model for the beam scanning is then obtained, and the symptoms of abnormal operations can be analyzed to achieve on-line diagnosis. Furthermore, a fuzzy expert system is developed to advise operators on making appropriate adjustments for the beam scanning. This supervisory system has been implemented on Eaten NV-6200 A/AV ion implanters at the Taiwan Semiconductor Manufacturing Company. (C) 1999 Elsevier Science Ltd. All rights reserved.	en_US
dc.language.iso	en_US	en_US
dc.subject	ion implantation	en_US
dc.subject	beam maps	en_US
dc.subject	supervision	en_US
dc.subject	feature extraction	en_US
dc.subject	symptom analysis	en_US
dc.subject	fuzzy expert systems	en_US
dc.title	An intelligent supervisory system for ion implantation in IC fabrication processes	en_US
dc.type	Article	en_US
dc.identifier.journal	CONTROL ENGINEERING PRACTICE	en_US
dc.citation.volume	7	en_US
dc.citation.issue	2	en_US
dc.citation.spage	241	en_US
dc.citation.epage	247	en_US
dc.contributor.department	電控工程研究所	zh_TW
dc.contributor.department	Institute of Electrical and Control Engineering	en_US
dc.identifier.wosnumber	WOS:000079300200011	-
dc.citation.woscount	3	-
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