標題: Measurement of optical activity using a photoelastic modulator system
作者: Wang, CK
Chao, YF
光電工程學系
Department of Photonics
關鍵字: photoelastic modulator;ellipticity;wave plate
公開日期: 1-Feb-1999
摘要: Adjusting the analyzer at 90 degrees to the strain axis of a photoelastic modulator, one can determine the optical activity by measuring the slope of its DC intensity distribution under various phase modulation amplitudes. This technique was applied to measure the ellipticity of few quartz quarter-wave plates and the optical rotation of an optical active crystal. A multiple reflection enhancement effect in the wave prate was observed and discussed. By considering the photoelastic modulator as an elliptical retarder, we also determined its intrinsic ellipticity and static phase retardation, to increase the accuracy of measurements.
URI: http://dx.doi.org/10.1143/JJAP.38.941
http://hdl.handle.net/11536/31557
ISSN: 0021-4922
DOI: 10.1143/JJAP.38.941
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume: 38
Issue: 2A
起始頁: 941
結束頁: 944
Appears in Collections:Articles


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