An analytical grain-barrier height model and its characterization for intrinsic poly-Si thin-film transistor

Abstract

An analytical model for the grain-barrier height of the intrinsic poly-Si thin-film transistors (TFT's) is developed, in which the grain-barrier height for the applied gate voltage smaller than the threshold voltage is obtained by solving the charge neutrality equation and the grain-barrier height for the applied gate voltage larger than the threshold voltage is obtained by using the quasi-two-dimensional (2-D) method. Good agreements between experimental and simulation results are obtained for wide gate voltage range.