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dc.contributor.authorLo, Hung-Chunen_US
dc.contributor.authorTsai, Jeff T. H.en_US
dc.contributor.authorleu, Jih-Perngen_US
dc.contributor.authorChen, Chia-Fuen_US
dc.date.accessioned2014-12-08T15:47:46Z-
dc.date.available2014-12-08T15:47:46Z-
dc.date.issued2010-11-01en_US
dc.identifier.issn1071-1023en_US
dc.identifier.urihttp://dx.doi.org/10.1116/1.3506089en_US
dc.identifier.urihttp://hdl.handle.net/11536/31948-
dc.description.abstractField emission of electrons from single crystal gallium phosphide (GaP) nanotips has been investigated. GaP nanotip arrays were fabricated using silane-methane-argon-hydrogen based plasma using the self-masking dry etching technique in an electron-cyclotron-resonance microwave plasma enhanced chemical vapor deposition system. These nanotips have an average of 2 and 80 nm in apex and bottom diameters, respectively. They are 900 nm in height, which makes them the perfect electron emission source for their high aspect ratio topography. A nanosized silicon carbide (SiC) cap on each GaP nanotip in the array has been found. The SiC core has a heterointerface with GaP crystal that was observed using a high resolution transmission electron microscope. Field emission analysis shows low turn-on fields of 8.5-9 V/mu m. Cold electron emissions in Fowler-Nordheim type current-voltage were observed from such GaP nanotip arrays. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3506089]en_US
dc.language.isoen_USen_US
dc.titleElectron field emission from well-aligned GaP nanotipsen_US
dc.typeArticleen_US
dc.identifier.doi10.1116/1.3506089en_US
dc.identifier.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ben_US
dc.citation.volume28en_US
dc.citation.issue6en_US
dc.citation.spage1284en_US
dc.citation.epage1286en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000285015200164-
dc.citation.woscount0-
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