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dc.contributor.authorHsieh, Yeou-langen_US
dc.contributor.authorTzeng, Gwo-hshiungen_US
dc.contributor.authorLin, T. R.en_US
dc.contributor.authorYu, Hsiao-chengen_US
dc.date.accessioned2014-12-08T15:47:47Z-
dc.date.available2014-12-08T15:47:47Z-
dc.date.issued2010-11-01en_US
dc.identifier.issn0894-6507en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TSM.2010.2065510en_US
dc.identifier.urihttp://hdl.handle.net/11536/31959-
dc.description.abstractYield analysis is one of the most important subjects in IC companies. During the initial stage of new process development, several factors can greatly impact the yield simultaneously. Traditionally, several learning cycle iterations are required to solve yield loss issues. This paper describes a novel way to diagnose yield loss issues in less iteration. First, the failure classification of bitmap data is transferred to a new basis using principal component analysis. Second, the defective rates are calculated and the original bitmap data is reconstructed in the principal basis, allowing the yield loss space to be generated by Cluster Analysis. Third, physical failure analysis samples can be selected to solve yield loss issues. Furthermore, the new yield loss basis can be used to monitor the progress of yield improvement as a discriminate analysis measure for reducing failure patterns (bitmap failures).en_US
dc.language.isoen_USen_US
dc.subjectBitmapen_US
dc.subjectcluster analysisen_US
dc.subjectdiscriminate analysisen_US
dc.subjectprincipal component analysis (PCA)en_US
dc.subjectyield analysisen_US
dc.subjectyield loss spaceen_US
dc.titleWafer Sort Bitmap Data Analysis Using the PCA-Based Approach for Yield Analysis and Optimizationen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TSM.2010.2065510en_US
dc.identifier.journalIEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURINGen_US
dc.citation.volume23en_US
dc.citation.issue4en_US
dc.citation.spage493en_US
dc.citation.epage502en_US
dc.contributor.department科技管理研究所zh_TW
dc.contributor.departmentInstitute of Management of Technologyen_US
dc.identifier.wosnumberWOS:000283942900001-
dc.citation.woscount2-
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