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dc.contributor.authorWu, Yi-Hongen_US
dc.contributor.authorKuo, Po-Yien_US
dc.contributor.authorLu, Yi-Hsienen_US
dc.contributor.authorChen, Yi-Hsuanen_US
dc.contributor.authorChao, Tien-Shengen_US
dc.date.accessioned2014-12-08T15:48:00Z-
dc.date.available2014-12-08T15:48:00Z-
dc.date.issued2010-11-01en_US
dc.identifier.issn0741-3106en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2010.2061215en_US
dc.identifier.urihttp://hdl.handle.net/11536/32032-
dc.description.abstractWe have successfully fabricated the symmetric vertical-channel Ni-salicided polycrystalline silicon thin-film transistors (VSA-TFTs) for the first time. The transfer characteristics of VSA-TFTs show a sharp turning between subthreshold and ON state. The OFF-state currents can be improved by a modified overetching of oxide, equivalent dual-gate structure, and n(+) floating-region length. The ON-state currents can be enhanced by Ni-salicidation. The VSA-TFTs display a good subthreshold swing of 220 mV/dec, steep mobility increase (field-effect mobility of 76 cm(2)/ V . s), and large ON/OFF-current ratio of more than 109 (I(OFF) = 4 x 10 (14), I(ON) = 7 x 10 (5), and W(mask)/L(mask) = 10 mu m/3 mu m).en_US
dc.language.isoen_USen_US
dc.subjectNi-salicideden_US
dc.subjectpolycrystalline silicon thin-film transistors (poly-Si TFTs)en_US
dc.subjectsymmetric S/Den_US
dc.subjectvertical channelen_US
dc.titleNovel Symmetric Vertical-Channel Ni-Salicided Poly-Si Thin-Film Transistors With High ON/OFF-Current Ratioen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LED.2010.2061215en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.citation.volume31en_US
dc.citation.issue11en_US
dc.citation.spage1233en_US
dc.citation.epage1235en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000283448300020-
dc.citation.woscount3-
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