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dc.contributor.authorChung, Tung-Hsunen_US
dc.contributor.authorLiao, Wen-Hsuanen_US
dc.contributor.authorLin, Shih-Yenen_US
dc.date.accessioned2014-12-08T15:48:03Z-
dc.date.available2014-12-08T15:48:03Z-
dc.date.issued2010-11-01en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3504654en_US
dc.identifier.urihttp://hdl.handle.net/11536/32044-
dc.description.abstractThe influence of preoxidation GaAs surface treatment over the atomic force microscopy-induced local anodic oxidation (LAO) is investigated in this paper. By immerging the GaAs samples into NaOH aqueous solutions, higher nano-oxides with better height distribution could be observed after LAO. The phenomenon is attributed to the hydrophilic surfaces obtained after the treatment such that higher local humidity and uniform water molecular distribution would be obtained on the GaAs surfaces, by using the higher nano-oxides with better height uniformity, nanomesas by using wet chemical etching, and nanometal contact after oxide lift-off are fabricated. (C) 2010 American Institute of Physics. [doi:10.1063/1.3504654]en_US
dc.language.isoen_USen_US
dc.titleThe fabrication of nanomesas and nanometal contacts by using atomic force microscopy lithographyen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.3504654en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume108en_US
dc.citation.issue9en_US
dc.citation.spageen_US
dc.citation.epageen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
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