標題: Laser, buffer layer and CoCrPtO(x)-assisted low temperature fabrication process of a small-sized-CNT pattern by MPCVD
作者: Teng, I-Ju
Hong, Tsai-Hau
Hsu, Hui-Lin
Jian, Sheng-Rui
Wang, Wei-Hsiang
Kuo, Cheng-Tzu
材料科學與工程學系
Department of Materials Science and Engineering
公開日期: 1-Oct-2010
摘要: For improving compatibility with IC processes, this work presents a low temperature process (<400 degrees C) to fabricate a small-sized-carbon nanotube (CNT) (<6 graphene layers) pattern by buffer layer (AlN) and CoCrPtO(x) catalyst precursor-assisted microwave plasma chemical vapor deposition (MPCVD). Without high temperature heating on the whole specimen, the low temperature process mainly results from selective local activation laser heating (>= 600 degrees C) to form the catalyst nanostructures, which are beneficial to low temperature H-plasma treatment to form catalyst nanoparticles for CNT growth. The functions of the buffer layer and the catalyst precursor are to help the heat dissipation and the small-sized CNT formation. (C) 2010 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.tsf.2010.04.110
http://hdl.handle.net/11536/32122
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2010.04.110
期刊: THIN SOLID FILMS
Volume: 518
Issue: 24
起始頁: 7348
結束頁: 7351
Appears in Collections:Articles