标题: | Effects of Oxygen Addition and Treating Distance on Surface Cleaning of ITO Glass by a Non-Equilibrium Nitrogen Atmospheric-Pressure Plasma Jet |
作者: | Chiang, M-H Liao, K-C Lin, I-M Lu, C-C Huang, H-Y Kuo, C-L Wu, J-S Hsu, C-C Chen, S-H 机械工程学系 Department of Mechanical Engineering |
关键字: | Atmospheric-pressure plasma jet;DBD;ITO;Quasi-pulsed;Surface cleaning |
公开日期: | 1-十月-2010 |
摘要: | Effects of oxygen addition and treating distance on cleaning organic contaminants on stationary and non-stationary (1-9 cm/s) ITO glass surfaces by a parallel-plate nitrogen-based dielectric barrier discharge (DBD) are investigated experimentally; the DBD is driven by a 60 kHz bipolar quasi-pulsed power source. The results show that two regimes of favorable operating condition for improving the hydrophilic property of the surface (reducing the contact angle from 84 degrees to 25-30 degrees) are found. The measured spatial distribution of NO-gamma UV emission, O(3) concentration and OES spectra are shown to strongly correlate with the measured hydrophilic property. At the near jet downstream locations (z < 10 mm), the metastable N(2)(A(3)Sigma(+)(mu)) and photo-induced dissociation of ozone play dominant roles in cleaning the ITO glass surface; while at the far jet downstream locations (z > 10 mm), where the ratio of oxygen to nitrogen is lower, only the long-lived metastable N(2)(A(3)Sigma(+)(mu) ) plays a major role in cleaning the ITO glass surface. |
URI: | http://dx.doi.org/10.1007/s11090-010-9237-4 http://hdl.handle.net/11536/32139 |
ISSN: | 0272-4324 |
DOI: | 10.1007/s11090-010-9237-4 |
期刊: | PLASMA CHEMISTRY AND PLASMA PROCESSING |
Volume: | 30 |
Issue: | 5 |
起始页: | 553 |
结束页: | 563 |
显示于类别: | Articles |
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