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dc.contributor.authorLai, Chun-Fengen_US
dc.contributor.authorKuo, Hao-Chungen_US
dc.contributor.authorChao, Chia-Hsinen_US
dc.contributor.authorYu, Peichenen_US
dc.contributor.authorYeh, Wen-Yungen_US
dc.date.accessioned2014-12-08T15:48:13Z-
dc.date.available2014-12-08T15:48:13Z-
dc.date.issued2010-10-01en_US
dc.identifier.issn0733-8724en_US
dc.identifier.urihttp://dx.doi.org/10.1109/JLT.2010.2061836en_US
dc.identifier.urihttp://hdl.handle.net/11536/32141-
dc.description.abstractThis study theoretically and experimentally investigates the highly directional far-field emission patterns of GaN photonic crystal (PhC) micro-cavity light-emitting diodes (MCLEDs) depending on varying structural parameters. Angular-spectra-resolved electroluminescence measurements reveals the behavior of guided-mode extraction which is significantly affected by the structural parameters of GaN PhC MCLEDs, where the GaN cavity thickness decides the extracted guided mode numbers, PhC lattice constant influences the distribution of far-field emission, and PhC hole depth affects the interaction with guided modes. The proposed GaN ultrathin MCLED (uMCLED) with PhC lattice constant of 420 nm and deep hole depth of 250 nm exhibited a maximum output light extraction efficiency of 248% under one-watt input power compared to GaN non-PhC uMCLED and produced a directional far-field emission pattern at half intensity near +/- 17 degrees. The present results indicate that highly directional light extraction enhancement could contribute to developments of many applications, especially for etendue-limited applications such as pico-projectors.en_US
dc.language.isoen_USen_US
dc.subjectGaNen_US
dc.subjectlight-emitting diodes (LEDs)en_US
dc.subjectmicro-cavityen_US
dc.subjectphotonic crystals (PhCs)en_US
dc.titleStructural Effects on Highly Directional Far-Field Emission Patterns of GaN-Based Micro-Cavity Light-Emitting Diodes With Photonic Crystalsen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/JLT.2010.2061836en_US
dc.identifier.journalJOURNAL OF LIGHTWAVE TECHNOLOGYen_US
dc.citation.volume28en_US
dc.citation.issue19en_US
dc.citation.spage2881en_US
dc.citation.epage2889en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000283351200003-
dc.citation.woscount6-
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