完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Li, J. C. | en_US |
dc.contributor.author | Lu, T. C. | en_US |
dc.contributor.author | Huang, H. M. | en_US |
dc.contributor.author | Chan, W. W. | en_US |
dc.contributor.author | Kuo, H. C. | en_US |
dc.contributor.author | Wang, S. C. | en_US |
dc.date.accessioned | 2014-12-08T15:48:17Z | - |
dc.date.available | 2014-12-08T15:48:17Z | - |
dc.date.issued | 2010-09-15 | en_US |
dc.identifier.issn | 0021-8979 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1063/1.3483239 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/32191 | - |
dc.description.abstract | Nonpolar (a-plane) GaN nanorod arrays with embedded In(x)Ga(1-x)N/GaN (x=0.09, 0.14, 0.24, and 0.30) multiple quantum wells (MQWs) grown on r-plane sapphire have been fabricated successfully by self-assembled Ni nanomasks and subsequent inductively coupled plasma reactive-ion etching. After nanorod fabrications, the polarization ratio of the emission from MQWs with lower indium composition (x=0.09 and 0.14) slightly decreases but apparently increases by at most 79% for the samples with higher indium composition (x=0.24 and 0.30). Competition between the effect of multiple scattering, strain relaxation and reduction in localized centers, expected in a-plane MQW samples, are attributed to the variations in the polarization ratios after the nanorod formation. (c) 2010 American Institute of Physics. [doi:10.1063/1.3483239] | en_US |
dc.language.iso | en_US | en_US |
dc.subject | gallium compounds | en_US |
dc.subject | III-V semiconductors | en_US |
dc.subject | indium compounds | en_US |
dc.subject | nanofabrication | en_US |
dc.subject | nanorods | en_US |
dc.subject | self-assembly | en_US |
dc.subject | semiconductor growth | en_US |
dc.subject | semiconductor quantum wells | en_US |
dc.subject | wide band gap semiconductors | en_US |
dc.title | Characteristics of emission polarization in a-plane nanorods embedded with InGaN/GaN multiple quantum wells | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.3483239 | en_US |
dc.identifier.journal | JOURNAL OF APPLIED PHYSICS | en_US |
dc.citation.volume | 108 | en_US |
dc.citation.issue | 6 | en_US |
dc.citation.spage | en_US | |
dc.citation.epage | en_US | |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Department of Photonics | en_US |
顯示於類別: | 期刊論文 |