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dc.contributor.authorCHIOU, BSen_US
dc.contributor.authorSHEU, JYen_US
dc.contributor.authorWU, WFen_US
dc.date.accessioned2014-12-08T15:04:43Z-
dc.date.available2014-12-08T15:04:43Z-
dc.date.issued1992-12-01en_US
dc.identifier.issn0361-5235en_US
dc.identifier.urihttp://dx.doi.org/10.1007/BF02667601en_US
dc.identifier.urihttp://hdl.handle.net/11536/3223-
dc.description.abstractTemperature dependence of sheet resistance for a generic RuO2-based resistor with a composition of 20 wt.% RuO2-80 wt.% glass (63 wt.% PbO-25 wt.% B2O3-12 wt.% SiO2) is evaluated. A combined tunnel/parallel conduction model is employed to describe the resistance behavior with respect to the temperature variation. The geometry of the resistive film, such as the aspect ratio and thickness, cast a significant effect on the electrical characteristic of the thick film assembly. It is observed that shorter resistive films exhibit smaller resistivity as compared to that of the longer film. Thinner resistive films have smaller resistivity as compared to the thicker ones. In addition, 1/f noise is the dominating contribution in the thick film resistor. The presence of 1/f noise can be qualitatively explained with the aid of the tunneling mechanism.en_US
dc.language.isoen_USen_US
dc.subjectTHICK FILMen_US
dc.subjectRESISTORen_US
dc.subjectNOISEen_US
dc.titleSIZE EFFECT ON THE ELECTRICAL-CONDUCTION AND NOISE OF RUO2-BASED THICK-FILM RESISTORSen_US
dc.typeArticleen_US
dc.identifier.doi10.1007/BF02667601en_US
dc.identifier.journalJOURNAL OF ELECTRONIC MATERIALSen_US
dc.citation.volume21en_US
dc.citation.issue12en_US
dc.citation.spage1105en_US
dc.citation.epage1110en_US
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.identifier.wosnumberWOS:A1992KF40800005-
dc.citation.woscount5-
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